Injection Compression Molding of Replica Molds for Nanoimprint Lithography
نویسندگان
چکیده
منابع مشابه
Injection Compression Molding of Replica Molds for Nanoimprint Lithography
As a breakthrough in the cost and durability of molds for nanoimprint lithography (NIL), replica molds are fabricated by injection compression molding (ICM). ICM is commonly used for optical disks such as DVDs or Blu-ray disks and is also a practical fabrication method for nanostructures. In this paper, I successfully demonstrated the fabrication of cycloolefin polymer replica molds with struct...
متن کاملEffective surface oxidation of polymer replica molds for nanoimprint lithography
In nanoimprint lithography, a surface oxidation process is needed to produce an effective poly(dimethylsiloxane) coating that can be used as an anti-adhesive surface of template molds. However, the conventional photooxidation technique or acidic oxidative treatment cannot be easily applied to polymer molds with nanostructures since surface etching by UV radiation or strong acids significantly d...
متن کامل9. Nanoimprint Lithography – Patterning of Resists Using Molding
Nanoimprint lithography (NIL) is an emerging high-resolution parallel patterning method, mainly aimed towards fields in which electronbeam and high-end photolithography are costly and do not provide sufficient resolution at reasonable throughput. In a top-down approach, a surface pattern of a stamp is replicated into a material by mechanical contact and threedimensional material displacement. T...
متن کاملNanoimprint lithography
Nowadays, nanodevices like small fluidic channels, semiconductor lasers, nano contacts for solar cells, nano magnets or nano antennas for infrared detection (THz) are of great interest. The applications for these devices extend the fields of e.g. energy, computational or medical sciences. For example, by arranging nano dots consisting of a magnetic material, logical circuits can be designed whi...
متن کاملNanoimprint Lithography
The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Polymers
سال: 2014
ISSN: 2073-4360
DOI: 10.3390/polym6030604